Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

All-implanted planar-buried-heterostructure graded-index separate-confinement-heterostructure laser in GaAs/AlGaAs

Conference ·
OSTI ID:6331563

We report operation of an all-implanted planar-buried heterostructure graded-index separate-confinement-heterostructure laser in GaAs/AlGaAs. The structure utilizes only Si and Be ion-implantation and rapid thermal annealing to form both the reverse blocking junctions and the buried-heterostructure waveguide. 1 ref., 2 figs.

Research Organization:
Sandia National Labs., Albuquerque, NM (USA)
DOE Contract Number:
AC04-76DP00789
OSTI ID:
6331563
Report Number(s):
SAND-88-3099C; CONF-890423-1; ON: DE89002892
Country of Publication:
United States
Language:
English