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Specimen preparation by radio frequency planar magnetron sputtering

Journal Article · · J. Vac. Sci. Technol., A; (United States)
DOI:https://doi.org/10.1116/1.573491· OSTI ID:6325082
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Sector type targets were used to fabricate a series of alloys by planar magnetron sputtering with an RF mode. From the binary Co--M system (M: Al, Si, Ti, Cr, Fe, Ni, Cu, Zr, Nb, Mo, Ag, Ta, and W) RF sputtering yield ratios were compared with dc sputtering yields by Laegreid and Wehner. It was found that RF planar magnetron sputtering was well predicted by dc plasma discharge data. The relation of the RF peak-to-peak voltage and Ar ion energy is discussed. Cosputtering of dissimilar elements caused cross contamination on the target surface and it was attributed to the seeding effect. The application to a ternary system Co--Nb--Zr known as an amorphous soft magnetic material was quite successful and suggests sector target to be a convenient way for searching new materials.
Research Organization:
Sony Corporation Research Center, 174 Fujitsuka-cho, Hodogaya-ku, Yokohama 240, Japan
OSTI ID:
6325082
Journal Information:
J. Vac. Sci. Technol., A; (United States), Journal Name: J. Vac. Sci. Technol., A; (United States) Vol. 4:1; ISSN JVTAD
Country of Publication:
United States
Language:
English

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Related Subjects

36 MATERIALS SCIENCE
360101* -- Metals & Alloys-- Preparation & Fabrication
ALLOYS
ALUMINIUM
ALUMINIUM ALLOYS
ARGON IONS
CHARGED PARTICLES
CHROMIUM
CHROMIUM ALLOYS
COBALT
COBALT ALLOYS
COPPER
COPPER ALLOYS
ELECTRIC DISCHARGES
ELECTRON TUBES
ELECTRONIC EQUIPMENT
ELEMENTS
EQUIPMENT
FABRICATION
IONS
IRON
IRON ALLOYS
MAGNETIC MATERIALS
MAGNETRONS
MATERIALS
METALLIC GLASSES
METALS
MICROWAVE EQUIPMENT
MICROWAVE TUBES
MOLYBDENUM
MOLYBDENUM ALLOYS
NICKEL
NICKEL ALLOYS
NIOBIUM
NIOBIUM ALLOYS
SEMIMETALS
SILICON
SILICON ALLOYS
SILVER
SILVER ALLOYS
SPUTTERING
TANTALUM
TANTALUM ALLOYS
TITANIUM
TITANIUM ALLOYS
TRANSITION ELEMENTS
TUNGSTEN
TUNGSTEN ALLOYS
ZIRCONIUM
ZIRCONIUM ALLOYS