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Interface-state measurements on sos using the charge-pumping technique on gated-diode test structures

Conference · · IEEE Trans. Nucl. Sci.; (United States)
OSTI ID:6318728

The radiation-induced interface-state density in CMOS/SOS was measured with the charge-pumping technique using a new gated-diode test structure. The results were compared to the interface-state density measured with the subthreshold slope method in N- and P-channel MOSFET devices after exposure to radiation from a Co-60 source. Experimental results using the two methods on both depleted and non-depleted SOS-substrates were analyzed. With a combination of both methods, the interface-state density at the Si-Sapphire interface could be measured to D/sub it/ = 1.3 x 10/sup 12/eV/sup -1/. The charge-pumping technique can be utilized on SOI material and a direct method of measuring the interface-state density at the interface to the substrate isolation oxide is described. The test structures cam be implemented in a standard CMOS/SOS test die.

Research Organization:
Dept. of Solid State Electronics, Chalmers Univ. of Technology, Goeteborg (SE)
OSTI ID:
6318728
Report Number(s):
CONF-880730-
Journal Information:
IEEE Trans. Nucl. Sci.; (United States), Journal Name: IEEE Trans. Nucl. Sci.; (United States) Vol. 35:6; ISSN IETNA
Country of Publication:
United States
Language:
English

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