Macroparticle-free thin films produced by an efficient vacuum arc deposition technique

Journal Article · Wed Sep 15 04:00:00 EDT 1993 · Journal of Applied Physics; (United States)

DOI:https://doi.org/10.1063/1.354431· OSTI ID:6300708

Anders, S; Anders, A; Brown, I ^[1]

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1. Lawrence Berkeley Laboratory, University of California, Berkeley, California 94720 (United States)

Macroparticle-free films of various metals and diamond-like carbon have been obtained by a pulsed vacuum arc deposition technique. An axial magnetic field (100--200 mT) generated by the discharge current itself was used to focus the plasma produced by the cathode spots and to guide the plasma flow through a macroparticle filter. The films were characterized by scanning electron microscopy, atomic force microscopy, and Rutherford backscattering spectrometry. They were found to be macroparticle-free. The total efficiency of the combined gun-filter plasma source is even higher than a standard nonfiltered vacuum arc plasma source in terms of deposited film thickness per discharge, because the plasma losses in the filter are overcompensated by the focused plasma injection into the filter.

• DOE Contract Number: AC03-76SF00098
• OSTI ID: 6300708
• Journal Information: Journal of Applied Physics; (United States), Journal Name: Journal of Applied Physics; (United States) Vol. 74:6; ISSN JAPIAU; ISSN 0021-8979
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360601* -- Other Materials-- Preparation & Manufacture
661300 -- Other Aspects of Physical Science-- (1992-)
71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
CARBON
CURRENTS
DEPOSITION
DIAMONDS
ELECTRIC ARCS
ELECTRIC CURRENTS
ELECTRIC DISCHARGES
ELECTRON MICROSCOPY
ELEMENTAL MINERALS
ELEMENTS
FILMS
MICROSCOPY
MICROSTRUCTURE
MINERALS
NONMETALS
PLASMA GUNS
THIN FILMS