Virtually distortion-free imaging system for large field, high resolution lithography
Patent
·
OSTI ID:6291152
Virtually distortion free large field high resolution imaging is performed using an imaging system which contains large field distortion or field curvature. A reticle is imaged in one direction through the optical system to form an encoded mask. The encoded mask is then imaged back through the imaging system onto a wafer positioned at the reticle position.
- DOE Contract Number:
- W-7405-ENG-48
- Assignee:
- Dept. of Energy, Washington, DC (United States)
- Patent Number(s):
- US 5176970; A
- Application Number:
- PPN: US 7-597968
- OSTI ID:
- 6291152
- Resource Relation:
- Patent File Date: 12 Oct 1990
- Country of Publication:
- United States
- Language:
- English
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