Virtually distortion-free imaging system for large field, high resolution lithography using electrons, ions or other particle beams

Patent · Tue Jan 12 04:00:00 EST 1993

OSTI ID:6229628

Hawryluk, A M; Ceglio, N M

Virtually distortion free large field high resolution imaging is performed using an imaging system which contains large field distortion or field curvature. A reticle is imaged in one direction through the optical system to form an encoded mask. The encoded mask is then imaged back through the imaging system onto a wafer positioned at the reticle position. Particle beams, including electrons, ions and neutral particles, may be used as well as electromagnetic radiation.

• DOE Contract Number: W-7405-ENG-48
• Assignee: Dept. of Energy, Washington, DC (United States)
• Patent Number(s): US 5178974; A
• Application Number: CNN: N00024-79-C4026; PPN: US 7-683011
• OSTI ID: 6229628
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
426000* -- Engineering-- Components
Electron Devices & Circuits-- (1990-)
BEAMS
DEPOSITION
ELECTROMAGNETIC RADIATION
ELECTRONIC CIRCUITS
IMAGES
INTEGRATED CIRCUITS
MASKING
MICROELECTRONIC CIRCUITS
OPTICAL SYSTEMS
PARTICLE BEAMS
RADIATIONS
RESOLUTION
SCREEN PRINTING
SPATIAL RESOLUTION
SURFACE COATING