Virtually distortion-free imaging system for large field, high resolution lithography

Patent · 01 January 1993

OSTI ID:868622

Hawryluk, Andrew M ^[1]; Ceglio, Natale M ^[2]

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1. Modesto, CA
2. Livermore, CA

Virtually distortion free large field high resolution imaging is performed using an imaging system which contains large field distortion or field curvature. A reticle is imaged in one direction through the optical system to form an encoded mask. The encoded mask is then imaged back through the imaging system onto a wafer positioned at the reticle position.

• Research Organization: Lawrence Livermore National Laboratory (LLNL), Livermore, CA
• DOE Contract Number: W-7405-ENG-48
• Assignee: United States of America as represented by United States (Washington, DC)
• Patent Number(s): US 5176970
• OSTI ID: 868622
• Country of Publication: United States
• Language: English

Related Subjects

/430/355/
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