skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Ion irradiation of metal-semiconductor interfaces, and applications to electrical contacts

Miscellaneous ·
OSTI ID:6280918

In the initial stages of this work the phase transformations in a number of ion implanted silicides were investigated. The results were interpreted as possible evidence for the existence of crystalline nuclei in the implanted silicide layer, even after high ion doses. In a study on the effect of ion mixing on multilayer samples with various layer thicknesses, it was found that for samples with an overall composition in a two phase region of the Ni-Si phase diagram equilibrium phases were always the first to form. At higher doses an amorphous phase was also present, but even at the very highest doses a crystalline equilibrium phase was observed, as expected from the initial study. Metal-silicon interactions in ion mixing may differ with those of the corresponding thermally annealed cases. Evidence is presented here that while the moving species under ion mixing appears to be strongly influenced by the implantation damage (defect) distribution in the sample, further experimentation indicated that the relative ranges of the secondary recoils may explain this observation. The final chapters of the dissertation consider the application of ion beam mixing to improving the electrical properties of devices. Ion mixing was found to decrease the interfacial roughness in PtSi/Si Schottky barrier diodes, while at the same time decreasing the reverse current and improving the uniformity in electrical characteristics from device to device. Irradiation was used to promote the formation of a SiC layer at a Si/diamond interface, leading to a Si/SiC/diamond graded bandgap structure. The contact resistance of such contacts was found to be comparable to the best ohmic contacts formed with Ta/Au, but with considerably less deviation.

Research Organization:
California Univ., San Diego, CA (USA)
OSTI ID:
6280918
Resource Relation:
Other Information: Thesis (Ph. D.)
Country of Publication:
United States
Language:
English

Similar Records

Redistribution of implanted dopants after metal-silicide formation
Journal Article · Fri Dec 01 00:00:00 EST 1978 · J. Appl. Phys.; (United States) · OSTI ID:6280918

A model to non-uniform Ni Schottky contact on SiC annealed at elevated temperatures
Journal Article · Mon Jun 29 00:00:00 EDT 2015 · Applied Physics Letters · OSTI ID:6280918

Ion beam induced diffusion and crystallization in high dose Er implanted Si
Conference · Mon Jan 01 00:00:00 EST 1990 · OSTI ID:6280918