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Growth and characterization of Hg/sub l-x/Cd/sub x/Te photochemical native oxides

Journal Article · · J. Electrochem. Soc.; (United States)
DOI:https://doi.org/10.1149/1.2095493· OSTI ID:6237612
The authors report results on the growth of Hg/sub 1-x/Cd/sub x/Te native oxides using ultraviolet radiation. This method provides a dry, clean, low-temperature process for growing native oxides on Hg/sub 1-x/Cd/sub x/Te. Measurements of the stoichiometry and thicknesses of these oxides are presented and possible growth mechanisms discussed. The stoichiometry of the oxide/Hg/sub 1-x/Cd/sub x/Te interface after annealing is examined with regard to the encapsulation properties of these layers. Preliminary results obtained for high-temperature photochemical oxidation are also reported.
Research Organization:
Hewlett-Packard Optoelectronics Div., San Jose, CA (US); Stanford Electronics Labs., Stanford, CA (US)
OSTI ID:
6237612
Journal Information:
J. Electrochem. Soc.; (United States), Journal Name: J. Electrochem. Soc.; (United States) Vol. 135:12; ISSN JESOA
Country of Publication:
United States
Language:
English