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SiO/sub 2//Si interface probed with a variable-energy positron beam

Journal Article · · Appl. Phys. Lett.; (United States)
DOI:https://doi.org/10.1063/1.98818· OSTI ID:6230044

The annihilation characteristics of a monoenergetic beam of positrons, after implantation in Si with a 350-nm overlayer of SiO/sub 2/, were measured as a function of mean implantation depth. Positrons implanted overlapping the SiO/sub 2//Si interface were observed to decay from a state with properties distinctively different from the state in bulk Si and the thermally grown SiO/sub 2/, i.e., a positron interface state. The momentum distribution of the annihilating positron-electron pair, as observed in the Doppler broadening of the annihilation line, is much broader for this state than for either bulk Si or SiO/sub 2/, in contrast to previously observed localized positron states in solids and at surfaces which show a narrower distribution.

Research Organization:
Brookhaven National Laboratory, Upton, New York 11973
DOE Contract Number:
AC02-76CH00016
OSTI ID:
6230044
Journal Information:
Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 51:13; ISSN APPLA
Country of Publication:
United States
Language:
English