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The SiO/sub 2//Si interface probed with positrons

Conference ·
OSTI ID:5649463

The effects of the heat treatment of Si covered with a thermally-grown approx.50 nm overlayer of SiO/sub 2/ were probed by means of measurements of positron annihilation characteristics obtained with a variable-energy positron beam. From measurements at elevated temperature (approx.500/sup 0/C) it was observed that positrons implanted overlapping the SiO/sub 2//Si interface decay from a state with properties distinctively different from the state in Si and in SiO/sub 2/. The nature of the annihilation characteristics indicates the presence of open volume defects. 19 refs., 2 figs., 1 tab.

Research Organization:
Brookhaven National Lab., Upton, NY (USA); International Business Machines Corp., Yorktown Heights, NY (USA). Thomas J. Watson Research Center
DOE Contract Number:
AC02-76CH00016
OSTI ID:
5649463
Report Number(s):
BNL-40722; CONF-871124-86; ON: DE88006361
Country of Publication:
United States
Language:
English