Role of silylene in the pyrolysis of silane and organosilanes

Journal Article · Thu Oct 06 04:00:00 EDT 1988 · J. Phys. Chem.; (United States)

DOI:https://doi.org/10.1021/j100331a047· OSTI ID:6219230

O'Brien, J J; Atkinson, G H

The role of the silylene radical, SiH/sub 2/, in the pyrolytic decomposition of silane and organosilanes is examined. Silylene is detected directly in absorption by intracavity laser spectroscopy (ILS). This represents the first reported detection of SiH/sub 2/ during the pyrolytic decomposition of silanes. The high detection sensitivity of ILS for absorption measurements enables the in situ examination of the pyrolytic decomposition processes under reaction conditions chosen to facilitate film growth rather than to optimize spectroscopic detection. The relative amount of gas-phase SiH/sub 2/, as measured by ILS data during chemical vapor deposition (CVD), correlates well with changes in the temperature and gas-flow rates in the pyrolysis chamber and with semiquantitative observations of the rate of film growth. These results demonstrate the importance of homogeneous reactions such as those involving SiH/sub 2/ in the pyrolytic CVD of silicon films.

• Research Organization: Univ. of Arizona, Tucson (USA)
• OSTI ID: 6219230
• Journal Information: J. Phys. Chem.; (United States), Journal Name: J. Phys. Chem.; (United States) Vol. 92:20; ISSN JPCHA
• Country of Publication: United States
• Language: English

Related Subjects

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
400800* -- Combustion
Pyrolysis
& High-Temperature Chemistry
42 ENGINEERING
420800 -- Engineering-- Electronic Circuits & Devices-- (-1989)
CHEMICAL COATING
CHEMICAL REACTIONS
CHEMICAL VAPOR DEPOSITION
DATA
DECOMPOSITION
DEPOSITION
EXPERIMENTAL DATA
FILMS
HYDRIDES
HYDROGEN COMPOUNDS
INFORMATION
LASER SPECTROSCOPY
NUMERICAL DATA
ORGANIC COMPOUNDS
ORGANIC SILICON COMPOUNDS
PYROLYSIS
RADICALS
SILANES
SILICON COMPOUNDS
SPECTROSCOPY
SURFACE COATING
THERMOCHEMICAL PROCESSES
THIN FILMS