Structure and properties of ion-implanted Al/sub 2/O/sub 3/

Conference · Sat Dec 31 23:00:00 EST 1983

OSTI ID:6215850

McHargue, C J; Farlow, G C; White, C W; Appleton, B R; Angelini, P; Naramoto, H

The effects of implantation parameters temperature (77 to 640 K), ion species (Cr, Zr, Nb, Al+O, Xe), and fluence (1 x 10/sup 14/ to 1 x 10/sup 17/ ions.cm/sup -2/) on the structure and surface hardness of Al/sub 2/O/sub 3/ have been studied. Low temperatures favor the rapid accumulation of damage and formation of an amorphous layer. Except for zirconium, fluences in excess of 1 x 10/sup 17/ ions.cm/sup -2/ are required to amorphize Al/sub 2/O/sub 3/ at 300 K. The amorphous phase has a hardness about 65% of that of the crystalline phase.

• Research Organization: Oak Ridge National Lab., TN (USA); Japan Atomic Energy Research Inst., Tokai, Ibaraki
• DOE Contract Number: AC05-84OR21400
• OSTI ID: 6215850
• Report Number(s): CONF-841117-35; ON: DE85005374
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360206* -- Ceramics
Cermets
& Refractories-- Radiation Effects
ALUMINIUM COMPOUNDS
ALUMINIUM OXIDES
AMORPHOUS STATE
CHALCOGENIDES
CHANNELING
CHARGED PARTICLES
CHROMIUM IONS
DAMAGE
ELASTIC SCATTERING
HARDNESS
ION CHANNELING
ION IMPLANTATION
IONS
MECHANICAL PROPERTIES
OXIDES
OXYGEN COMPOUNDS
RUTHERFORD SCATTERING
SCATTERING
XENON IONS
ZIRCONIUM IONS