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Initiation of electroless nickel plating on copper, palladium-activated copper, gold, and platinum

Journal Article · · J. Electrochem. Soc.; (United States)
DOI:https://doi.org/10.1149/1.2115559· OSTI ID:6213667
The catalytic activity of copper, palladium-activated copper, gold, and platinum for electro-oxidation of hypophosphite and electroless nickel plating was investigated in an ammoniacal solution of pH 8.8 at 50/sup 0/C by potential measurements and linear sweep voltammetry from -0.3 to -0.92V vs. SCE. Early stages of nickel plating on copper-palladium substrates were studied by scanning electron microscopy in conjunction with EDAX. It was found that palladium-activated copper and gold were catalytically active in the entire range of potentials examined; copper was active below -0.6 platinum was not active at all. Small amounts of electrolytically deposited nickel considerably increased the electro-oxidation rate of hypophosphite on copper, gold, and palladium. TEM examinations showed that activation of copper in a PdCl/sub 2//HCl solution resulted in the deposition of palladium in the form of separate patches. Electroless nickel deposition on copper substrates with separate palladium spots took place on copper and palladium independently of each other. The deposition on palladium was faster than that on copper. It was concluded that the activation of copper substrates around palladium spots occurred solely through a spontaneous potential shift, induced by electro-oxidation of hypophosphite on the palladium spots. It was suggested that small amounts of one metal synergistically enhanced the catalytic activity of the other metals.
Research Organization:
Materials Engineering Department, Rensselaer Polytechnic Institute, Troy, New York
OSTI ID:
6213667
Journal Information:
J. Electrochem. Soc.; (United States), Journal Name: J. Electrochem. Soc.; (United States) Vol. 131:2; ISSN JESOA
Country of Publication:
United States
Language:
English