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Majority and minority carrier traps in monocrystalline CuInSe[sub 2]

Journal Article · · Journal of Electronic Materials (A.I.M.E. Metallurgical Society); (United States)
DOI:https://doi.org/10.1007/BF02665026· OSTI ID:6203391
;  [1]
  1. McGill Univ., Montreal (Canada)

Electron and hole traps in Bridgeman-grown monocrystalline CuInSe[sub 2] were investigated by carrying out deep level transient spectroscopy measurements on homojunctions, Al-CuInSe[sub 2] (p-type), and Au-CuInSe[sub 2] (n-type) Schottky junctions. Three hole trap levels and two electron trap levels were observed on these devices. Effects of oxygen and etching on the electron trap level at 182 [+-] 15 meV from the conduction band edge were specifically studied. It was found that the election trap densities in the homojunctions prepared using the CuInSe[sub 2] samples treated in NH[sub 2]NH[sub 2] solution, which absorbes oxygen atoms in the samples, were larger than the electron trap densities in the homojunctions prepared using untreated samples. Moreover, the electron trap densities in the homojunctions after prolonged heat treatment in O[sub 2] were less than that without prolonged heat treatment. The results thus suggested that oxygen atoms in CuInSe[sub 2] can reduce the electron trap density of p-type CuInSe[sub 2]. The effects of chemical etching on these electron traps were also studied. The excess indium atoms in the CuInSe[sub 2] were considered to affect the electron traps. 10 refs., 2 figs., 4 tabs.

OSTI ID:
6203391
Journal Information:
Journal of Electronic Materials (A.I.M.E. Metallurgical Society); (United States), Journal Name: Journal of Electronic Materials (A.I.M.E. Metallurgical Society); (United States) Vol. 22:2; ISSN JECMA5; ISSN 0361-5235
Country of Publication:
United States
Language:
English