Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Epitaxial thin films of YBa sub 2 Cu sub 3 O sub 7 minus x on LaAlO sub 3 substrates deposited by plasma-enhanced metalorganic chemical vapor deposition

Journal Article · · Applied Physics Letters; (USA)
DOI:https://doi.org/10.1063/1.104973· OSTI ID:6195183
; ; ; ; ; ;  [1]
  1. EMCORE Corporation, 35 Elizabeth Avenue, Somerset, New Jersey 08873 (US)
High quality epitaxial YBa{sub 2}Cu{sub 3}O{sub 7{minus}{ital x}} (YBCO) superconducting thin films (0.3 {mu}m thick) were grown on the closely lattice and thermal expansion matched substrate, LaAlO{sub 3}, which has low dielectric loss. The YBCO layers were prepared, {ital in} {ital situ}, by a microwave plasma-enhanced metalorganic chemical vapor deposition process. The films, which had mirror-like smooth surfaces, were deposited at a substrate temperature of 730 {degree}C with a partial pressure of 2 Torr of N{sub 2}O. The electrical resistance and magnetic susceptibility versus temperature of the as-deposited films show metallic behavior in the normal state and sharp superconducting transitions with {ital T}{sub {ital c}} ({ital R}=0) of 88 K. Critical current densities measured on patterned bridges were 5{times}10{sup 5} A/cm{sup 2} at 78 K for the films deposited on LaAlO{sub 3}. X-ray diffraction measurements indicate that films grow epitaxially in the plane of the substrate with axis perpendicular to the substrate surface.
OSTI ID:
6195183
Journal Information:
Applied Physics Letters; (USA), Journal Name: Applied Physics Letters; (USA) Vol. 58:2; ISSN APPLA; ISSN 0003-6951
Country of Publication:
United States
Language:
English