High-quality YBa sub 2 Cu sub 3 O sub 7 minus x thin films by plasma-enhanced metalorganic chemical vapor deposition at low temperature

Journal Article · Mon Sep 02 04:00:00 EDT 1991 · Applied Physics Letters; (United States)

DOI:https://doi.org/10.1063/1.105468· OSTI ID:5411641

Zhao, J; Li, Y Q; Chern, C S; Lu, P; Norris, P; Gallois, B; Kear, B; Cosandey, F; Wu, X D; Muenchausen, R E; Garrison, S M ^[1]

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1. EMCORE Corporation, 35 Elizabeth Avenue, Somerset, New Jersey (USA)

Single-crystalline epitaxial YBa{sub 2}Cu{sub 3}O{sub 7-{ital x}} thin films with a sharp superconducting transition temperature of 90 K and a critical current density of 3.3{times}10{sup 6} A/cm{sup 2} at 77 K were prepared by a plasma-enhanced metalorganic chemical vapor deposition (PE-MOCVD) process. The films were formed {ital in} {ital situ} on (100) LaAlO{sub 3} substrates at a temperature of 670 {degree}C in 2 Torr partial pressure of N{sub 2}O. X-ray analysis indicated that films grew epitaxially with the {ital c}-axis perpendicular to the substrate and the {ital a} and {ital b} axes uniformly aligned along the LaAlO{sub 3} (100) directions. High-resolution transmission electron microscopy along with electron diffraction revealed that the films grew epitaxially with atomically abrupt film-substrate interfaces. The high degree of epitaxial crystallinity of the films was also confirmed by Rutherford backscattering spectroscopy which gave a minimum channeling yield of 9%.

• OSTI ID: 5411641
• Journal Information: Applied Physics Letters; (United States), Journal Name: Applied Physics Letters; (United States) Vol. 59:10; ISSN APPLA; ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360202* -- Ceramics
Cermets
& Refractories-- Structure & Phase Studies
360204 -- Ceramics
Cermets
& Refractories-- Physical Properties
ALKALINE EARTH METAL COMPOUNDS
ALUMINATES
ALUMINIUM COMPOUNDS
BARIUM COMPOUNDS
BARIUM OXIDES
CHALCOGENIDES
CHANNELING
CHEMICAL COATING
CHEMICAL VAPOR DEPOSITION
COHERENT SCATTERING
COPPER COMPOUNDS
COPPER OXIDES
CRITICAL CURRENT
CRYSTALS
CURRENTS
DEPOSITION
DIFFRACTION
ELASTIC SCATTERING
ELECTRIC CONDUCTIVITY
ELECTRIC CURRENTS
ELECTRICAL PROPERTIES
ELECTRON DIFFRACTION
ELECTRON MICROSCOPY
EPITAXY
FILMS
HIGH TEMPERATURE
HIGH-TC SUPERCONDUCTORS
IN-SITU PROCESSING
INTERFACES
LANTHANUM COMPOUNDS
LOW PRESSURE
MICROSCOPY
MONOCRYSTALS
NITROGEN COMPOUNDS
NITROGEN OXIDES
NITROUS OXIDE
OXIDES
OXYGEN COMPOUNDS
PARTIAL PRESSURE
PHYSICAL PROPERTIES
PLASMA
PROCESSING
RARE EARTH COMPOUNDS
RUTHERFORD SCATTERING
SCATTERING
SUPERCONDUCTING FILMS
SUPERCONDUCTIVITY
SUPERCONDUCTORS
SURFACE COATING
THERMODYNAMIC PROPERTIES
TRANSITION ELEMENT COMPOUNDS
TRANSITION TEMPERATURE
TRANSMISSION ELECTRON MICROSCOPY
X-RAY DIFFRACTION
YTTRIUM COMPOUNDS
YTTRIUM OXIDES