Alternative deposition processes for hydrogenated amorphous silicon and related alloys

Journal Article · · Applied Physics Communications; (USA)

OSTI ID:6194231

Tsuo, Y S; Luft, W ^[1]

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1. Solar Energy Research Institute, Golden, CO (USA)

Plasma-assisted chemical vapor deposition (CVD), also known as glow discharge deposition, has become the most common technique used in the deposition of hydrogenated amorphous silicon (a-Si:H) for semiconductor device applications. The best-quality a-Si:H material to date is deposited by glow discharge, especially under high vacuum conditions that ensure low impurity levels of oxygen, carbon, and nitrogen. However, the conventional glow discharge deposition method has its limitations. In this report, the authors review several alternative deposition processes to glow discharge for a-Si:H-based alloys. They group these alternative processes into major categories, including (1) modifications of conventional glow discharge, (2) remote-plasma-assisted CVD, (3) photochemical vapor deposition (photo-CVD), (4) thermally-induced CVD, (5) spontaneous CVD, and (6) physical vapor deposition (PVD) methods. They also include in the review posthydrogenation methods for amorphous silicon. The material properties for the resulting a-Si:H(:F) and a-SiGe:H(:F) films are compared for these alternative deposition methods. a-Si:H films nearly as good as those produced by glow discharge have been achieved by photo-CVD.

• DOE Contract Number: AC02-83CH10093
• OSTI ID: 6194231
• Journal Information: Applied Physics Communications; (USA), Journal Name: Applied Physics Communications; (USA) Vol. 10:1-2; ISSN 0277-9374; ISSN APCOD
• Country of Publication: United States
• Language: English

Related Subjects

14 SOLAR ENERGY
140501* -- Solar Energy Conversion-- Photovoltaic Conversion
36 MATERIALS SCIENCE
360601 -- Other Materials-- Preparation & Manufacture
AMORPHOUS STATE
CHEMICAL COATING
CHEMICAL REACTIONS
CHEMICAL VAPOR DEPOSITION
DEFECTS
DEPOSITION
DIRECT ENERGY CONVERTERS
DOCUMENT TYPES
EQUIPMENT
MATERIALS
MEASURING METHODS
PHOTOCHEMICAL REACTIONS
PHOTOELECTRIC CELLS
PHOTOVOLTAIC CELLS
PHYSICAL VAPOR DEPOSITION
REVIEWS
SEMICONDUCTOR MATERIALS
SILICON SOLAR CELLS
SOLAR CELLS
SOLAR EQUIPMENT
SURFACE COATING