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U.S. Department of Energy
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Amorphous boron-silicon-hydrogen alloys for thin-film heterojunction solar cells. Quarterly technical progress report No. 2, 1 September 1980-30 November 1980

Technical Report ·
OSTI ID:6172925
The conductivity of a-B:Si:H films increases with substrate temperature and annealing temperature for temperatures up to 500/sup 0/C (highest investigated). However, increasing the conductivity causes the optical gap to decrease. Preliminary results on a-B:Si:H/a-Si:H heterojunction devices are not encouraging as interface states appear to limit the conversion efficiency to approx. 1.5%.
Research Organization:
Solar Energy Research Inst., Golden, CO (USA); RCA Labs., Princeton, NJ (USA)
DOE Contract Number:
AC02-77CH00178
OSTI ID:
6172925
Report Number(s):
SERI/PR-0-9010-2; ON: DE81027234
Country of Publication:
United States
Language:
English