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Title: Amorphous boron-silicon-hydrogen alloys for thin-film heterojunction solar cells. Final report, 1 June 1980-31 May 1981

Technical Report ·
OSTI ID:5356335

Amorphous boron-silicon-hydrogen (a-B:Si:H) films have been grown in dc proximity glow discharges in atmospheres containing B/sub 2/H/sub 6/, SiH/sub 4/ and H/sub 2/. The films are p-type and exhibit conductivities as high as approx. 3 x 10/sup -4/ ..cap omega../sup -1/ cm/sup -1/. The conductivity of a-B:Si:H films increases with substrate temperature and annealing temperature for temperatures up to 500/sup 0/C (highest investigated). However, increasing the conductivity causes the optical gap to decrease. Amorphous boron-silicon-hydrogen alloys have been used to make heterojunction contacts to hydrogenated amorphous silicon (a-Si:H) films. The best conversion efficiency for these heterojunction devices is approx. 1.65% as compared to approx. 5.5% for a-Si:H p-i-n devices made in the same system with similar deposition conditions. The performance of a-B:Si:H/a-Si:H heterojunction cells appears to be limited mainly by a large density of interface states that act as trapping and recombination centers. Also investigated is another p-type, wide bandgap material, namely, microcrystalline silicon-carbon-hydrogen (m-Si:C:H). Three techniques to make m-Si:C:H films were explored: glow-discharge deposition, thermal annealing of a-Si:C:H films, and laser annealing of a-Si:C:H films. While results indicate that laser annealing is the most promising approach, the formation of microblisters prevented us from fabricating devices.

Research Organization:
Solar Energy Research Inst. (SERI), Golden, CO (United States); RCA Labs., Princeton, NJ (USA)
DOE Contract Number:
AC02-77CH00178
OSTI ID:
5356335
Report Number(s):
SERI/PR-0-9010-4; ON: DE82016854
Country of Publication:
United States
Language:
English