Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

High-fluence ion damage effects in Ar-implanted (InGa)As/GaAs strained-layer superlattices

Journal Article · · Appl. Phys. Lett.; (United States)
DOI:https://doi.org/10.1063/1.98823· OSTI ID:6166642

We have characterized (InGa)As/GaAs strained-layer superlattices (SLS's) that have been implanted with 300 keV argon ions at room temperature for fluences sufficient to induce precipitous stress relief in the implanted composite. SLS compositional modulation is lost due to ion beam mixing over much of the ion range; however, the implanted regions remain crystalline despite extensive damage near the mean ion range. High-density dislocation networks are found near the substrate-buffer interface after precipitous stress relief and are correlated with the occurrence of the effect.

Research Organization:
Sandia National Laboratories, Albuquerque, New Mexico 87185
OSTI ID:
6166642
Journal Information:
Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 51:11; ISSN APPLA
Country of Publication:
United States
Language:
English