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Study of the deposition of polymeric material onto surfaces from fluorocarbon RF plasmas

Journal Article · · Plasma Chem. Plasma Process.; (United States)
DOI:https://doi.org/10.1007/BF00565553· OSTI ID:6161377
A series of fluorocarbon gases, viz., CF/sub 4/, C/sub 2/F/sub 6/, C/sub 3/F/sub 8/, and CHF/sub 3/, have been compared for their relative tendencies to deposit polymeric material onto various surfaces, including Si and SiO/sub 2/, under RF plasma conditions. The plasmas were examined by optical emission spectroscopy. C/sub 3/F/sub 8/ and CHF/sub 3/ were found to produce the highest yields of polymers, although these exhibited significant differences in structure (as shown by XPS and IR) and differences in thermal stability, both of which could be minimized by replacing the C/sub 3/F/sub 8/ gas with a C/sub 3/F/sub 8//H/sub 2/ mixture. The polymers produced from CHF/sub 3/ under the conditions of the present study were found to accumulate preferentially onto Si rather than SiO/sub 2/, as verified by the technique of Rutherford backscattering spectrometry.
Research Organization:
Plasma Technology (UK) Ltd., Bristol, England
OSTI ID:
6161377
Journal Information:
Plasma Chem. Plasma Process.; (United States), Journal Name: Plasma Chem. Plasma Process.; (United States) Vol. 6:4; ISSN PCPPD
Country of Publication:
United States
Language:
English

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