Study of fluorocarbon plasma in 60 and 100 MHz capacitively coupled discharges using mass spectrometry

Journal Article · Mon Sep 15 04:00:00 EDT 2008 · Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films

DOI:https://doi.org/10.1116/1.2965812· OSTI ID:21192417

Ushakov, Andrey; Volynets, Vladimir; Jeong, Sangmin; Sung, Dougyong; Ihm, Yongho; Woo, Jehun; Han, Moonhyeong ^[1]

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1. Mechatronics and Manufacturing Technology Center, Samsung Electronics Co. Ltd., 416 Maetan-3 dong, Yeongtong-Gu, Suwon, Gyeonggi-Do 443-742 (Korea, Republic of)

The signals of positive ions and radicals formed in the fluorocarbon plasma of the capacitively coupled plasma reactor were measured using a quadrupole mass spectrometry and optical emission actinometry. The plasma was produced at 60 and 100 MHz frequencies for the same reactor configuration and gas mixtures. Experiments were performed at 25 mTorr with a SiO{sub 2} wafer on the grounded electrode. Mass spectra of ions were measured in C{sub 4}F{sub 8}/O{sub 2}/Ar and C{sub 4}F{sub 6}/O{sub 2}/Ar gas mixtures at 500-1500 W generator powers. For 60 and 100 MHz discharges production of fluorocarbon ions and radicals is discussed. It was found that the production of heavy species increases with frequency. The high mass signals such as C{sub 3}F{sub 3}{sup +}, C{sub 2}F{sub 4}{sup +}, C{sub 2}F{sub 5}{sup +}, C{sub 3}F{sub 5}{sup +}, C{sub 4}F{sub 7}{sup +} decrease when CHF{sub 3} is added to the gas mixture. However, the signals of CF{sub x}{sup +} (x=1,2,3) do not change significantly. These results are compared to the results of polymer film deposition on the wafer. It was suggested to control the polymerization film formation by adding small amount of CHF{sub 3} to the process mixture.

• OSTI ID: 21192417
• Journal Information: Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films, Journal Name: Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films Journal Issue: 5 Vol. 26; ISSN 1553-1813
• Country of Publication: United States
• Language: English

Related Subjects

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
CATIONS
FILMS
FLUOROFORM
HIGH-FREQUENCY DISCHARGES
MASS SPECTRA
MASS SPECTROSCOPY
MHZ RANGE
MIXTURES
PLASMA
PLASMA PRODUCTION
POLYMERIZATION
POLYMERS
SILICA
SILICON OXIDES