Surface interactions of C{sub 3} radicals during the deposition of fluorocarbon and hydrocarbon films

Journal Article · Thu Nov 15 04:00:00 EST 2007 · Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films

DOI:https://doi.org/10.1116/1.2784717· OSTI ID:21020883

Dongping, Liu; Fisher, Ellen R ^[1]

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1. Department of Chemistry, Colorado State University, Fort Collins, Colorado 80523-1872 (United States)

The gas-phase density and surface interactions of the carbon trimer C{sub 3} have been examined in fluorocarbon and hydrocarbon plasmas. The {sup 1}{pi}{sub u}-{sup 1}{sigma}{sub g}{sup +} fluorescence excitation spectra and relative gas-phase densities of C{sub 3} radicals have been collected using laser-induced fluorescence (LIF) spectroscopy. The relative C{sub 3} density increases significantly with CH{sub 2}F{sub 2} in the feed, indicating that C{sub 3} is primarily produced via decomposing CH{sub 2}F{sub 2} and chemical reactions in the gas phase. In addition, the surface reactivity R of C{sub 3} has been measured during fluorocarbon and hydrocarbon film depositions using C{sub 3}F{sub 8}/CH{sub 2}F{sub 2} and CH{sub 4}/CH{sub 2}F{sub 2} 13.56 MHz rf plasmas. The C{sub 3} radicals were characterized using our LIF-based imaging of radicals interacting with surfaces technique. R values for C{sub 3} range from 0.10 to 0.38, depending on plasma conditions, but show no clear dependence on the gas mixture or the plasma conditions used. X-ray photoelectron spectroscopy measurements of the films deposited in these systems provide additional evidence that suggests that C{sub 3} carbon clusters may be contributing to the formation of more cross-linked films.

• OSTI ID: 21020883
• Journal Information: Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films, Journal Name: Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films Journal Issue: 6 Vol. 25; ISSN 1553-1813
• Country of Publication: United States
• Language: English

Related Subjects

75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
CARBON
CARBON FLUORIDES
DENSITY
DEPOSITION
EXCITATION
FILMS
FLUORESCENCE
LASER SPECTROSCOPY
METHANE
MHZ RANGE
MIXTURES
PLASMA
PLASMA DIAGNOSTICS
RADICALS
SURFACES
X-RAY PHOTOELECTRON SPECTROSCOPY