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1988 proceedings of the fifth international IEEE VLSI multilevel interconnection conference

Conference ·
OSTI ID:6160942
These proceedings collect papers given at a conference on Very Large Scale Integration (VLSI). Topics include: dielectric planarization, semiconductor junctions, metal-on-silicon (MOS) transistors, sputtering, ion etching, tungsten vapor deposition, vapor deposited coatings.
OSTI ID:
6160942
Report Number(s):
CONF-8806180-
Country of Publication:
United States
Language:
English