Efficient injection locking of an e-beam-excited XeF laser

Journal Article · Sat Aug 01 04:00:00 EDT 1981 · J. Appl. Phys.; (United States)

DOI:https://doi.org/10.1063/1.329400· OSTI ID:6156117

West, J B; Komine, H; Stappaerts, E A

Narrowband ultraviolet radiation from a frequency-doubled dye laser has been used to control the linewidth and polarization of a long pulse length, electron-beam-excited XeF laser. Linewidths of 0.004 nm have been achieved in the 353-nm band of the XeF B..-->..X laser transition. Over 90% of the energy in the free-running laser pulse has been extracted in the narrowband injection-locked pulse. Ratios of injection signal power to output laser power on the order of 1:5000 are adequate for efficient injection-locking to occur.

• Research Organization: Northrop Corporation, Northrop Research and Technology Center, One Research Park, Palos Verdes Peninsula, California 90274
• OSTI ID: 6156117
• Journal Information: J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Vol. 52:8; ISSN JAPIA
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
420300* -- Engineering-- Lasers-- (-1989)
BEAMS
DYE LASERS
EFFICIENCY
ELECTROMAGNETIC RADIATION
ELECTRON BEAMS
ENERGY-LEVEL TRANSITIONS
EXCITATION
FLUORIDES
FLUORINE COMPOUNDS
FREQUENCY CONVERTERS
GAS LASERS
HALIDES
HALOGEN COMPOUNDS
LASERS
LEPTON BEAMS
LINE WIDTHS
LIQUID LASERS
MODE LOCKING
PARTICLE BEAMS
POLARIZATION
PULSES
RADIATIONS
RARE GAS COMPOUNDS
ULTRAVIOLET RADIATION
WAVELENGTHS
XENON COMPOUNDS
XENON FLUORIDES