Injection-controlled tuning of an electron-beam excited XeF(C. -->. A) laser

Journal Article · Sat Nov 01 04:00:00 EST 1986 · IEEE J. Quant. Electron.; (United States)

DOI:https://doi.org/10.1109/JQE.1986.1072910· OSTI ID:7222083

Tittel, F K; Marowsky, G; Nighan, W L; Zhu, Y; Sauerbrey, R A; Wilson, Jr, W L

Efficient, ultra-narrow spectral output from an electron-beam excited XeF(C in equilibrium A) laser medium has been achieved by injection-controlled tuning. Using a pulsed dye laser as the injection source, amplified output pulses tunable between 435 and 535 nm and having a spectral width of 0.001 nm were obtained. For a 482.5 nm infection wavelength that is well matched to the XeF(C in equilibrium A) gain maximum, output energy density and intrinsic efficiency values of approximately 8 J/1 and 6 percent were achieved.

• Research Organization: Dept. of Electrical and Computer Engineering, Rice Univ., Houston, TX 77251
• OSTI ID: 7222083
• Journal Information: IEEE J. Quant. Electron.; (United States), Journal Name: IEEE J. Quant. Electron.; (United States) Vol. QE-22:11; ISSN IEJQA
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
420300* -- Engineering-- Lasers-- (-1989)
AMPLIFICATION
DYE LASERS
EFFICIENCY
ELECTRICAL PUMPING
ELECTRON BEAM PUMPING
ENERGY DENSITY
ENERGY-LEVEL TRANSITIONS
EXCIMER LASERS
EXCITATION
FLUORIDES
FLUORINE COMPOUNDS
GAIN
GAS LASERS
HALIDES
HALOGEN COMPOUNDS
LASERS
LIQUID LASERS
PULSES
PUMPING
RARE GAS COMPOUNDS
TUNING
WAVELENGTHS
XENON COMPOUNDS
XENON FLUORIDES