Preparation and structure of rare earth transition metal alloy thin films

Journal Article · Thu Dec 31 23:00:00 EST 1992 · Materials Research Bulletin; (United States)

DOI:https://doi.org/10.1016/0025-5408(93)90009-3· OSTI ID:6154331

Qui, J F; Taylor, K N.R.; Russell, G J ^[1]

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1. Univ. of New South Wales, Kensington (Australia). Advanced Electronic Materials Physics

Quaternary GdTbFeCo alloy thin films with various thicknesses from 30 to 700nm have been rf-magnetron sputtered onto glass substrates, single crystal silicon wafers for SEM observations and carbon-coated 3mm diameter copper grids for TEM from the composite target made of an Fe[sub 80]Co[sub 20] powder alloy compact disk and Gd,Tb chips placed on the surface. The amorphous GdTbFeCo alloy thin films deposited by the present process are very uniform in thickness and composition. SEM and TEM observations show that the GdTbFeCo thin films are very smooth, dense and morphologically featureless. These results suggest that the sputter processing methods in the laboratory can be used to fabricate high quality rare earth-transition metal alloy thin films.

• OSTI ID: 6154331
• Journal Information: Materials Research Bulletin; (United States), Journal Name: Materials Research Bulletin; (United States) Vol. 28:1; ISSN MRBUAC; ISSN 0025-5408
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360101* -- Metals & Alloys-- Preparation & Fabrication
360102 -- Metals & Alloys-- Structure & Phase Studies
ALLOY SYSTEMS
ALLOYS
AMORPHOUS STATE
COBALT ALLOYS
CRYSTAL STRUCTURE
FABRICATION
FILMS
GADOLINIUM ALLOYS
IRON ALLOYS
RARE EARTH ALLOYS
SPUTTERING
SUBSTRATES
TERBIUM ALLOYS
THIN FILMS