Ion-beam deposition of Nb and Ta refractory superconducting films

Technical Report · Fri Jan 01 04:00:00 EST 1982

OSTI ID:6133149

Face, D W; Ruggiero, S T; Prober, D E

In this paper we report on the electrical, superconducting, and structural properties of ion-beam deposited Nb and Ta films produced using a Kaufman ion source. We find that after careful optimization of ion gun parameters and the use of Xe gas, this technique is capable of reproducibly depositing high quality superconducting Nb films on room temperature substrates. The deposition conditions are, in fact, less stringent than for e-beam or planar sputtering systems. We also find that by employing a multiple target capability, high quality Ta films can be produced under the same conditions by first depositing a thin underlayer of Nb.

• Research Organization: Yale Univ., New Haven, CT (USA)
• OSTI ID: 6133149
• Report Number(s): AD-A-123463/2
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360101 -- Metals & Alloys-- Preparation & Fabrication
360104* -- Metals & Alloys-- Physical Properties
656102 -- Solid State Physics-- Superconductivity-- Acoustic
Electronic
Magnetic
Optical
& Thermal Phenomena-- (-1987)
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
ARGON
BEAMS
CRYSTAL GROWTH
CRYSTAL STRUCTURE
DEPOSITION
ELECTRIC CONDUCTIVITY
ELECTRICAL PROPERTIES
ELEMENTS
FILMS
FLUIDS
GASES
ION BEAMS
METALS
NIOBIUM
NONMETALS
PHYSICAL PROPERTIES
RARE GASES
SPUTTERING
SUBSTRATES
SUPERCONDUCTIVITY
SUPERCONDUCTORS
TANTALUM
THIN FILMS
TRANSITION ELEMENTS
XENON