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Role of atomic oxygen in the low-temperature growth of YBa/sub 2/Cu/sub 3/O/sub 7-//sub delta/ thin films by laser ablation deposition

Journal Article · · Appl. Phys. Lett.; (United States)
DOI:https://doi.org/10.1063/1.101496· OSTI ID:6114726
Thin films of YBa/sub 2/Cu/sub 3/O/sub 7-//sub delta/ were deposited on (100) SrTiO/sub 3/ substrates held at 600 and 700 /sup 0/C in N/sub 2/O and O/sub 2/ ambients using 355 nm Nd-YAG laser pulses for ablation of the target. The experiments were done either in the presence or absence of 193 nm excimer laser irradiation of the ambient gas between the target and the substrate. Results without the excimer irradiation show that in 0.2 Torr of both N/sub 2/O and O/sub 2/, at 700 /sup 0/C substrate surface temperature, excellent smooth films with T/sub c/ (R = 0) of 93 K and J/sub c/ (88 K) of 1.3 x 10/sup 6/ A/cm/sup 2/ were obtained. At 600 /sup 0/C, semiconducting films with no superconducting transition were obtained in O/sub 2/ ambient, whereas in N/sub 2/O, semiconducting normal state behavior with broad superconducting transition was found. With the 193 nm irradiation, no change was observed in the electrical properties of the films deposited in O/sub 2/ at 600 /sup 0/C, whereas in N/sub 2/O reasonably good superconducting films with normal metallic behavior and T/sub c/ (R = 0) of 84 K were found. Since the 193 nm photons hardly dissociate O/sub 2/ molecules, but very efficiently photodissociate the N/sub 2/O molecules to form N/sub 2/ and O(/sup 1/D), it is concluded that the atomic oxygen produced by photodissociation of N/sub 2/O is responsible for the superconducting film deposition at 600 /sup 0/C.
Research Organization:
IBM Thomas J. Watson Research Center, Yorktown Heights, New York 10598
OSTI ID:
6114726
Journal Information:
Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 54:19; ISSN APPLA
Country of Publication:
United States
Language:
English

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