Low-temperature operation of multiple quantum-well Al/sub x/Ga/sub 1-x/As-GaAs p-n heterostructure lasers grown by metalorganic chemical vapor deposition. [4. 2 to 77/sup 0/K]
Journal Article
·
· J. Appl. Phys.; (United States)
The phonon-assisted laser operation (4.2--77 /sup 0/K) of multiple quantum-well Al/sub x/Ga/sub 1-x/As-GaAs heterostructure diodes is described. Laser operation is observed on phonon sidebands approx.36 meV below the lowest confined-particle transitions. Tunnel injection into the confined-particle states, with light emission and negative-resistance regions, is also observed in these multiple quantum-well heterostructures. Two different multiple quantum-well heterostructures grown by metalorganic chemical vapor deposition are described. The first consists of six GaAs quantum wells (L/sub z/approx.120 A) coupled by five Al/sub x/Ga/sub 1-x/As (xapprox.0.3) layers (approx.120 A), and the second is similar except for a reduction in layer size to approx.50 A.
- Research Organization:
- Department of Electrical Engineering and Materials Research Laboratory, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801
- OSTI ID:
- 6102561
- Journal Information:
- J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Vol. 50:9; ISSN JAPIA
- Country of Publication:
- United States
- Language:
- English
Similar Records
Phonon-sideband MO-CVD quantum-well Al/sub x/Ga/sub 1-x/As-GaAs heterostructure laser
Tunnel injection and phonon-assisted recombination in multiple quantum-well Al/sub x/Ga/sub 1-x/As-GaAs p-n heterostructure lasers grown by metalorganic chemical vapor deposition
Low-threshold continuous laser operation (300--337 /sup 0/K) of multilayer MO-CVD Al/sub x/Ga/sub 1-x/As-GaAs quantum-well heterostructures
Journal Article
·
Sat Apr 14 23:00:00 EST 1979
· Appl. Phys. Lett.; (United States)
·
OSTI ID:6476785
Tunnel injection and phonon-assisted recombination in multiple quantum-well Al/sub x/Ga/sub 1-x/As-GaAs p-n heterostructure lasers grown by metalorganic chemical vapor deposition
Journal Article
·
Sat Sep 01 00:00:00 EDT 1979
· J. Appl. Phys.; (United States)
·
OSTI ID:6258510
Low-threshold continuous laser operation (300--337 /sup 0/K) of multilayer MO-CVD Al/sub x/Ga/sub 1-x/As-GaAs quantum-well heterostructures
Journal Article
·
Sun Oct 15 00:00:00 EDT 1978
· Appl. Phys. Lett.; (United States)
·
OSTI ID:6650037
Related Subjects
36 MATERIALS SCIENCE
360601 -- Other Materials-- Preparation & Manufacture
42 ENGINEERING
420300* -- Engineering-- Lasers-- (-1989)
ALUMINIUM
ARSENIC COMPOUNDS
ARSENIDES
CHEMICAL COATING
CHEMICAL VAPOR DEPOSITION
CRYSTAL STRUCTURE
DEPOSITION
ELEMENTS
EMISSION
GALLIUM ARSENIDES
GALLIUM COMPOUNDS
LASERS
LOW TEMPERATURE
METALS
OPERATION
PARTICLES
PHONONS
PNICTIDES
QUASI PARTICLES
SEMICONDUCTOR DEVICES
SEMICONDUCTOR DIODES
SEMICONDUCTOR LASERS
SURFACE COATING
ULTRALOW TEMPERATURE
VERY LOW TEMPERATURE
360601 -- Other Materials-- Preparation & Manufacture
42 ENGINEERING
420300* -- Engineering-- Lasers-- (-1989)
ALUMINIUM
ARSENIC COMPOUNDS
ARSENIDES
CHEMICAL COATING
CHEMICAL VAPOR DEPOSITION
CRYSTAL STRUCTURE
DEPOSITION
ELEMENTS
EMISSION
GALLIUM ARSENIDES
GALLIUM COMPOUNDS
LASERS
LOW TEMPERATURE
METALS
OPERATION
PARTICLES
PHONONS
PNICTIDES
QUASI PARTICLES
SEMICONDUCTOR DEVICES
SEMICONDUCTOR DIODES
SEMICONDUCTOR LASERS
SURFACE COATING
ULTRALOW TEMPERATURE
VERY LOW TEMPERATURE