Studies of atomic and molecular fluorine reactions on silicon surfaces

Journal Article · Mon Mar 17 04:00:00 EST 1986 · Appl. Phys. Lett.; (United States)

DOI:https://doi.org/10.1063/1.96700· OSTI ID:6102058

Stinespring, C D; Freedman, A

X-ray photoelectron spectroscopy (XPS) and an ultrahigh vacuum compatible microwave discharge effusive beam source have been used to study the reactions of atomic and molecular fluorine on Si(111) surfaces. Fluorine uptake and changes in binding energy and peak shape for the Si 2p and F 1s XPS peaks have been measured as functions of fluorine exposure. The results indicate that molecular fluorine is dissociatively chemisorbed to form an SiF/sub 2/-like surface species. This reaction saturates at approximately one monolayer surface coverage. In contrast, atomic fluorine uptake extends well beyond the monolayer regime to include several Si layers. Additionally, as the uptake increases, the reaction product becomes SiF/sub 4/-like. These findings are compared with previously reported results for XeF/sub 2/ adsorption.

• Research Organization: Center for Chemical and Environmental Physics, Aerodyne Research, Inc., 45 Manning Road, Billerica, Massachusetts 01821
• OSTI ID: 6102058
• Journal Information: Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 48:11; ISSN APPLA
• Country of Publication: United States
• Language: English

Related Subjects

640301* -- Atomic
Molecular & Chemical Physics-- Beams & their Reactions
71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
ADSORPTION
ATOM COLLISIONS
ATOMIC BEAMS
BEAMS
CHEMICAL REACTIONS
CHEMISORPTION
COLLISIONS
ELECTRON SPECTROSCOPY
ELEMENTS
FLUORIDES
FLUORINE
FLUORINE COMPOUNDS
HALIDES
HALOGEN COMPOUNDS
HALOGENS
MOLECULE COLLISIONS
NONMETALS
PHOTOELECTRON SPECTROSCOPY
SEMIMETALS
SEPARATION PROCESSES
SILICON
SILICON COMPOUNDS
SILICON FLUORIDES
SORPTION
SORPTIVE PROPERTIES
SPECTROSCOPY
SURFACE PROPERTIES
SYNTHESIS