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Chemical selectivity in photon-stimulated desorption of fluorine from silicon

Journal Article · · Phys. Rev. Lett.; (United States)

Photon-stimulated desorption of F/sup +/ from Si(111) was studied with use of photon energies in the region of the Si 2p core level. Fluorinated surfaces with variable amounts of SiF/sub x/ groups were prepared, and distinct photon-stimulated--desorption thresholds in the Si 2p region were observed for F/sup +/ desorption from SiF vs SiF/sub 3/ surface groups. In addition, the angular distributions of the ejected F/sup +/ showed variations with respect to the Si(111) surface normal dependent on the bonding configuration, which were used to obtain local 2p absorption spectra for the individual SiF/sub x/ groups.

Research Organization:
IBM Thomas J. Watson Research Center, Yorktown Heights, New York 10598
OSTI ID:
5443441
Journal Information:
Phys. Rev. Lett.; (United States), Journal Name: Phys. Rev. Lett.; (United States) Vol. 60:10; ISSN PRLTA
Country of Publication:
United States
Language:
English