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Electron spectroscopic studies of the Dy/Si(111) interface

Journal Article · · J. Vac. Sci. Technol., A; (United States)
DOI:https://doi.org/10.1116/1.575804· OSTI ID:6100348

Low-energy electron diffraction (LEED), x-ray photoelectron (XPS), ultraviolet photoelectron (UPS), and Auger electron (AES) surface spectroscopic techniques were used to study the chemical interaction between Dy atoms and Si atoms at the Dy--Si interface at room temperature, as well as Dy silicides formed after annealing at 400 /degree/C for 30 min. Experiment shows that at low coverages (less than or equal to4 monolayers (ML)) atom intermixing takes place, causing chemical shifts of Dy 4/ital f/ and Dy 3/ital d/. However, no significant chemical shift of Si 2/ital p/ has been observed, suggesting a lack of strong chemical bonds of the Dy--Si type. With coverage increasing, a (7/times/7) LEED pattern from a clean Si(111) surface turns into a (1/times/1), and finally becomes ambiguous. After annealing for 30 min at 400 /degree/C, the Dy silicides formed with an atomic concentration ratio of Dy to Si of /similar to/1:2. The binding energies of Dy 4/ital f/ (Dy Si/sub 2/), Dy 3/ital d/(Dy Si/sub 2/), and Si 2/ital p/(Dy Si/sub 2/) are 5.5, 1295.2, and 98.65 eV, respectively.

Research Organization:
Institute of Semiconductors, Academia Sinica, P. O. Box 912, Beijing, Peoples Republic of China and Laboratory for Surface Physics, Academia Sinica, P. O. Box 603, Beijing, Peoples Republic of China(CN)
OSTI ID:
6100348
Journal Information:
J. Vac. Sci. Technol., A; (United States), Journal Name: J. Vac. Sci. Technol., A; (United States) Vol. 7:4; ISSN JVTAD
Country of Publication:
United States
Language:
English