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Enhanced radiation effects on submicron narrow-channel NMOS

Journal Article · · IEEE Trans. Nucl. Sci.; (United States)

The authors have observed an enhanced radiation sensitivity for narrow-channel NMOS transistors. The radiation-induced threshold shift increases rapidly as the channel width decreased below 4 ..mu..m. For example, with 4.5 ..mu..m channel lengths the radiation sensitivity for 0.8 ..mu..m wide FETs is twice that for 5 ..mu..m wide devices. This geometry dependence can be explained qualitatively by two-dimensional potential calculations. These calculations show the fringing field influence on threshold voltage is reduced after radiation, leading to a larger total shift for the narrow channel devices.

Research Organization:
Hughes Research Labs, 3011 Malibu Canyon Rd., Malibu, CA 90265
OSTI ID:
6089098
Journal Information:
IEEE Trans. Nucl. Sci.; (United States), Journal Name: IEEE Trans. Nucl. Sci.; (United States) Vol. 29:6; ISSN IETNA
Country of Publication:
United States
Language:
English