Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Monolithic integration of a very low threshold GaInAsP laser and metal-insulator-semiconductor field-effect transistor on semi-insulating InP

Journal Article · · Appl. Phys. Lett.; (United States)
DOI:https://doi.org/10.1063/1.93226· OSTI ID:5657826
Monolithic integration of 1.3-..mu..m groove lasers and metal-insulator-semiconductor field-effect transistors (MISFET) is achieved by a simple single liquid phase epitaxy (LPE) growth process. Laser thresholds as low as 14 mA for 300-..mu..m cavity length are obtained. MIS depletion mode FET's with n channels on LPE grown InP layer show typical transconductance of 5 to 10 mmho. Laser modulation by the FET current is demonstrated at up to twice the threshold current.
Research Organization:
California Inst. of Technology, Pasadena
OSTI ID:
5657826
Journal Information:
Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 40:8; ISSN APPLA
Country of Publication:
United States
Language:
English