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Structural properties of As-rich GaAs grown by molecular beam epitaxy at low temperatures

Journal Article · · Appl. Phys. Lett.; (United States)
DOI:https://doi.org/10.1063/1.101229· OSTI ID:6086158
GaAs layers grown by molecular beam epitaxy (MBE) at substrate temperatures between 200 and 300 /sup 0/C were studied using transmission electron microscopy (TEM), x-ray diffraction, and electron paramagnetic resonance (EPR) techniques. High-resolution TEM cross-sectional images showed a high degree of crystalline perfection of these layers. For a layer grown at 200 /sup 0/C and unannealed, x-ray diffraction revealed a 0.1% increase in the lattice parameter in comparison with bulk GaAs. For the same layer, EPR detected arsenic antisite defects with a concentration as high as 5 x 10/sup 18/ cm/sup -3/. This is the first observation of antisite defects in MBE-grown GaAs. These results are related to off-stoichiometric, strongly As-rich growth, possible only at such low temperatures. These findings are of relevance to the specific electrical properties of low-temperature MBE-grown GaAs layers.
Research Organization:
Center for Advanced Materials, Lawrence Berkeley Laboratory, Department of Materials Science and Mineral Engineering, University of California, Berkeley, California 94720
OSTI ID:
6086158
Journal Information:
Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 54:19; ISSN APPLA
Country of Publication:
United States
Language:
English