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Amorphous titanium carbide films produced by low-temperature organometallic CVD

Journal Article · · Advanced Ceramic Materials; (USA)
Amorphous titanium carbide films were produced by low-temperature (<300{degree}C) and low-pressure (< 10{sup {minus}3} Pa) metallorganic chemical vapor deposition from tetraneopentyl-titanium. X-ray and electron diffraction studies showed that the deposits were amorphous. The coatings were analyzed by Auger electron spectroscopy, electron energy loss spectroscopy, and electron spectroscopy for chemical analysis. The results of these studies suggest a deposition mechanism and lead to an understanding of the film morphology and microchemistry and the exceptional stability of the amorphous phase. It is believed that organic clusters and hydrogen, resulting from the decomposition of the Ti(neopenyl){sub 4} molecule, are present in the TiC films, and that they probably played a major role in stabilizing the amorphous phase to higher temperatures (> 1,000{degree}C) than typical glassy metals, in agreement with other studies of similar systems.
OSTI ID:
6073880
Journal Information:
Advanced Ceramic Materials; (USA), Journal Name: Advanced Ceramic Materials; (USA) Vol. 2:3A; ISSN 0883-5551; ISSN ACEME
Country of Publication:
United States
Language:
English