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Spray-deposited ZnO/InP SIS heterostructure solar cells

Conference · · Conf. Rec. IEEE Photovoltaic Spec. Conf.; (United States)
OSTI ID:6070575
ZnO/InP heterostructure solar cells have been fabricated by chemical spraying. Completed devices are stable SIS structures of n-ZnO, an interfacial thermal oxide, and single crystal p-type InP. Forward leakage currents are dominated by tunneling and interfacial recombination processes. High-temperature processing increases the forward leakage currents and yields an apparent increase in the density of near-interface localized states. Thin interfacial oxides suppress the formation of near-interface states, and are essential in obtaining optimal photovoltaic performance. Optimized ZnO/InP heterostructure solar cells have short-circuit current densities greater than 23 mA/cm/sup 2/, open-circuit current voltages of 0.68-0.72 V, fill factors above 0.70 and active area efficiencies of 13-14% in natural sunlight.
Research Organization:
Department of Materials Science and Engineering, Stanford University, Stanford, California
OSTI ID:
6070575
Report Number(s):
CONF-840561-
Conference Information:
Journal Name: Conf. Rec. IEEE Photovoltaic Spec. Conf.; (United States)
Country of Publication:
United States
Language:
English