Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Direct evidence of Cr-structural defect-oxygen interaction in ion-implanted GaAs

Conference ·
OSTI ID:6069586
The redistribution of Cr in GaAs implanted with either Ga and As, or Ga, As and O and subsequently furnace annealed was studied by secondary ion mass spectrometry. The depth distribution of the residual damage was obtained by cross-sectional transmission electron microscopy. At annealing temperatures of less than or equal to 600/sup 0/, there was a one to one depth correlation between the positions of the damage layers and peaks in the atomic profile of Cr. However, at annealing temperatures of greater than or equal to 800/sup 0/C such correlations were complicated by oxidation effects.
Research Organization:
Lawrence Livermore National Lab., CA (USA)
DOE Contract Number:
W-7405-ENG-48
OSTI ID:
6069586
Report Number(s):
LBL-13527; CONF-810994-1; ON: DE82002952
Country of Publication:
United States
Language:
English