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Ion implantation damage processes in nuclear waste glass and other silicate glasses

Conference ·
OSTI ID:6068238
Cantilever beam measurements of induced lateral stress have been made for He, Xe and Pb ion-implantation into the complex borosilicate radioactive waste glasses (PNL 76-68, SRP), a commercial borosilicate (Pyrex), and into fused SiO/sub 2/ (Suprasil 1). For the borosilicate glasses, implantation caused a buildup of stress to a saturation value (approx. 1 x 10/sup 5/ dynes/cm). The maximum occurred at ion fluences greater than those found for maximum stress in fused silica and without a stress relief mechanism. The separate family of stress curves for Pyrex and PNL 76-68 coincide when stress is plotted as a function of energy into electronic processes. Pyrex has 13 wgt.% B/sub 2/O/sub 3/ and 81 wgt.% SiO/sub 2/, while PNL 76-68 and SRP have 10% B/sub 2/O/sub 3/, 40% SiO/sub 2/ and 15% B/sub 2/O/sub 3/ and 58% SiO/sub 2/, respectively. Pyrex is known to be phase-separated, and the waste glasses are susceptible to phase separation. It is suggested that the B/sub 2/O/sub 3/ phase may be more easily compacted than the SiO/sub 2/ phase. The evidently greater effectiveness of the ionization component of the ion energy in creating damage in borosilicate glasses should be of considerable interest in waste glass studies because of the large amounts of ionization from ..cap alpha..-decay (approx. 5 MeV He).
Research Organization:
Sandia National Labs., Albuquerque, NM (USA)
DOE Contract Number:
AC04-76DP00789
OSTI ID:
6068238
Report Number(s):
SAND-84-1145C; CONF-841157-26; ON: DE85004170
Country of Publication:
United States
Language:
English