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Tilt grain boundaries in NiO

Conference ·
OSTI ID:6063936
This paper reports on our first attempts to apply high-resolution-electron microscopy (HREM) techniques to the imaging of <001> tilt grain boundaries in NiO. Since the (200) interplanar spacing in NiO is a/2 = 2.09 A, the new generation of ultra-high resolution electron microscopes with a point-to-point resolution <2A would be highly desirable for this work. However, the initial observations reported here were performed on a JE0L 200CX, operated at 200 kV.
Research Organization:
Argonne National Lab., IL (USA)
DOE Contract Number:
W-31109-ENG-38
OSTI ID:
6063936
Report Number(s):
CONF-850142-2; ON: DE85006839
Country of Publication:
United States
Language:
English