Superconducting and structure properties of niobium nitride prepared by rf magnetron sputtering
Journal Article
·
· J. Appl. Phys.; (United States)
The properties of rf-magnetron-sputtered NbN have been investigated for substrate temperatures from 200/sup 0/C to 750/sup 0/C as a function of the partial pressure of methane introduced into the Ar--N/sub 2/ sputtering gas mixture. The best films were prepared at elevated substrate temperatures with approximately 2% methane added to the sputter gas. These films also had resistivities approximately 70 ..mu cap omega.. cm. At lower substrate temperature, Tapprox.200/sup 0/C, the best attained T/sub c/ was approximately 13.3 K with a resistivity of 140 ..mu cap omega.. cm. The crystal structure of these materials was investigated using x-ray diffraction and Read x-ray photographs. Those films prepared with no added methane were found to be two-phase delta and epsilon NbN. The addition of a small amount of methane produced single delta phase NbN with a predominant (200) preferrential orientation. The delta phase lattice parameter was determined to vary approximately from 4.39 A to 4.45 A as the amount of methane was increased. The effect of hydrogen doping on NbN was to produce multiphase NbN with the epsilon, delta phases and some evidence of the ..beta.. phase. These material properties are of importance for the design and fabrication of NbN electrode Josephson tunnel junctions.
- Research Organization:
- Naval Research Laboratory, Washington, D. C. 20375-5000
- OSTI ID:
- 6063032
- Journal Information:
- J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Vol. 57:7; ISSN JAPIA
- Country of Publication:
- United States
- Language:
- English
Similar Records
Niobium nitride thin films for use in josephson junctions
Impurity effects in magnetron sputter deposited tungsten films
Reactively magnetron sputtered Hf-N films. II. Hardness and electrical resistivity
Conference
·
Thu Feb 28 23:00:00 EST 1985
· IEEE Trans. Magn.; (United States)
·
OSTI ID:6340243
Impurity effects in magnetron sputter deposited tungsten films
Journal Article
·
Fri Oct 31 23:00:00 EST 1986
· J. Vac. Sci. Technol., B; (United States)
·
OSTI ID:7007138
Reactively magnetron sputtered Hf-N films. II. Hardness and electrical resistivity
Journal Article
·
Tue Oct 15 00:00:00 EDT 1985
· J. Appl. Phys.; (United States)
·
OSTI ID:5235235
Related Subjects
420201* -- Engineering-- Cryogenic Equipment & Devices
71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
ALKANES
ARGON
COHERENT SCATTERING
CRYSTAL STRUCTURE
DESIGN
DIFFRACTION
ELECTRIC CONDUCTIVITY
ELECTRICAL PROPERTIES
ELECTRODES
ELEMENTS
FABRICATION
FILMS
FLUIDS
GASES
HIGH TEMPERATURE
HYDROCARBONS
JOSEPHSON JUNCTIONS
JUNCTIONS
LATTICE PARAMETERS
MEDIUM TEMPERATURE
METHANE
NIOBIUM COMPOUNDS
NIOBIUM NITRIDES
NITRIDES
NITROGEN
NITROGEN COMPOUNDS
NONMETALS
ORGANIC COMPOUNDS
PHYSICAL PROPERTIES
PNICTIDES
RARE GASES
REFRACTORY METAL COMPOUNDS
SCATTERING
SPUTTERING
SUPERCONDUCTING FILMS
SUPERCONDUCTING JUNCTIONS
SUPERCONDUCTIVITY
TRANSITION ELEMENT COMPOUNDS
ULTRALOW TEMPERATURE
X-RAY DIFFRACTION
71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
ALKANES
ARGON
COHERENT SCATTERING
CRYSTAL STRUCTURE
DESIGN
DIFFRACTION
ELECTRIC CONDUCTIVITY
ELECTRICAL PROPERTIES
ELECTRODES
ELEMENTS
FABRICATION
FILMS
FLUIDS
GASES
HIGH TEMPERATURE
HYDROCARBONS
JOSEPHSON JUNCTIONS
JUNCTIONS
LATTICE PARAMETERS
MEDIUM TEMPERATURE
METHANE
NIOBIUM COMPOUNDS
NIOBIUM NITRIDES
NITRIDES
NITROGEN
NITROGEN COMPOUNDS
NONMETALS
ORGANIC COMPOUNDS
PHYSICAL PROPERTIES
PNICTIDES
RARE GASES
REFRACTORY METAL COMPOUNDS
SCATTERING
SPUTTERING
SUPERCONDUCTING FILMS
SUPERCONDUCTING JUNCTIONS
SUPERCONDUCTIVITY
TRANSITION ELEMENT COMPOUNDS
ULTRALOW TEMPERATURE
X-RAY DIFFRACTION