Effect of noble gases on the properties of ion-beam-sputtered niobium films

Technical Report · Wed Feb 01 04:00:00 EST 1989

OSTI ID:6057077

Lichtenwalner, D J; Anderson, A C; Rudman, D A

All of the results presented here support the authors hypothesis that the reflection of the primary beam during sputtering plays a significant role in determining final film properties, especially in the case of ion-beam sputtering. The film properties are affected both by noble-gas incorporation in and noble-gas bombardment of the growing film. It is not as evident for sputtering in a planar arrangement for three main reasons: (i) the reflection coefficient is minimized by sputtering at normal incidence, (ii) the higher gas pressures used can scatter the reflected particles, and (iii) the target potential keeps any ionized reflected particles from escaping the dark space region, accelerating them back to the target.

• Research Organization: Massachusetts Inst. of Tech., Lexington (USA). Lincoln Lab.
• OSTI ID: 6057077
• Report Number(s): AD-A-205234/8/XAB; JA-6147
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360101* -- Metals & Alloys-- Preparation & Fabrication
360104 -- Metals & Alloys-- Physical Properties
BEAMS
ELEMENTS
FILMS
FLUIDS
GASES
HIGH PRESSURE
ION BEAMS
IONIZATION
METALS
NIOBIUM
NONMETALS
PARTICLES
RARE GASES
REFLECTION
SPUTTERING
THIN FILMS
TRANSITION ELEMENTS