Annealing behavior of magnetic anisotropy in CoNbZr films

Journal Article · Thu Sep 01 00:00:00 EDT 1988 · IEEE Trans. Magn.; (United States)

DOI:https://doi.org/10.1109/20.3430· OSTI ID:6050753

Miura, M; Katahashi, H; Muramori, K; Kajiyama, M

It was investigated how magnetic and nonmagnetic annealing influences the magnetic anisotropy in CoNbZr films formed by a dc opposing-targets sputtering method. It was revealed that the origin of the magnetic anisotropy is the directional ordering of the magnetic atoms. The anisotropy fields and the direction of the easy axis obtained when the films are annealed in zero magnetic field are almost the same as those for the magnetic field parallel to the easy axis of the as-deposited films. The activation energy of the as-deposited film is 0.86 eV. Annealing the film increases the activation energy which is 2.1 eV when the film is annealed at a temperature of 450/sup 0/C for 2 h.

• Research Organization: Consumer Products Research Center, Hitachi Ltd., Totsuku-ku, Yokohama (JP); Tokai Works, Hitachi Ltd., Katsutashi, Ibaragi-ken (JP)
• OSTI ID: 6050753
• Journal Information: IEEE Trans. Magn.; (United States), Journal Name: IEEE Trans. Magn.; (United States) Vol. 24:5; ISSN IEMGA
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360101* -- Metals & Alloys-- Preparation & Fabrication
360104 -- Metals & Alloys-- Physical Properties
656003 -- Condensed Matter Physics-- Interactions between Beams & Condensed Matter-- (1987-)
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
ACTIVATION ENERGY
ALLOYS
ANISOTROPY
ANNEALING
ATOMS
CHEMICAL COATING
CHEMICAL VAPOR DEPOSITION
COBALT ALLOYS
DEPOSITION
DIFFUSION
ENERGY
FILMS
HEAT TREATMENTS
HIGH TEMPERATURE
MAGNETIC FIELDS
MAGNETIC PROPERTIES
NIOBIUM ALLOYS
PHYSICAL PROPERTIES
SPUTTERING
SURFACE COATING
TARGETS
THIN FILMS
ZIRCONIUM ALLOYS