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Phase formation sequence in the Pd-GaAs system

Conference ·
OSTI ID:6047731
The morphological aspects of ternary phase formation during the Pd-GaAs reaction have been studied by application of transmission electron microscopy (TEM) and Rutherford backscattering (RBS) techniques. The TEM images show that the first product phase, ''phase I'', forms during deposition of Pd onto (100) GaAs and exhibits the preferred orientation (0001)/sub I/ approx. // (01 anti 1)/sub GaAs/. In the presence of unreacted Pd, the second phase, ''phase II'', nucleates at large-angle grain boundaries in the phase I film as the annealing temperature increases above approx.250C. Energy dispersive analysis of x-rays and RBS suggest the nominal compositions Pd3GaAs and Pd4GaAs for phases I and II, respectively.
Research Organization:
Bell Communications Research, Inc., Murray Hill, NJ (USA); Lawrence Berkeley Lab., CA (USA); Cornell Univ., Ithaca, NY (USA). Dept. of Materials Science and Engineering
DOE Contract Number:
AC03-76SF00098
OSTI ID:
6047731
Report Number(s):
LBL-20611; CONF-851217-41; ON: DE86006286
Country of Publication:
United States
Language:
English