RF magnetron sputtering of thick film amorphous beryllium

Conference · Wed Sep 19 00:00:00 EDT 1979

OSTI ID:6025624

Burt, R J; Meyer, S F; Hsieh, E J

Thick film coatings of beryllium, needed for the low-Z ablator layer in proposed laser fusion targets, have been prepared using high rate magnetron rf sputtering. The requirements for these Be coatings include thicknesses from 5 to 50 ..mu..m, complete freedom from surface defects, and an average surface roughness of 100 nm or less. We have sputtered very smooth, dense, thick Be films with surface roughness less than 100 nm. X-ray diffraction analysis of impurity doped films indicates an amorphous-like structure. Impurity stabilized amorphous Be with smooth surfaces is reported on both cooled copper and higher temperature glass substrates. The sputtering parameters (substrate temperature, deposition rate, argon pressure, and impurity gas levels) affecting surface roughness and film structure are discussed in terms of SEM, AES, and x-ray diffraction results.

• Research Organization: California Univ., Livermore (USA). Lawrence Livermore Lab.
• DOE Contract Number: W-7405-ENG-48
• OSTI ID: 6025624
• Report Number(s): UCRL-82778; CONF-791013-7
• Country of Publication: United States
• Language: English

Related Subjects

060201* -- Fusion Fuels-- Fabrication & Testing-- (1980-1987)
70 PLASMA PHYSICS AND FUSION TECHNOLOGY
ALKALINE EARTH METALS
BERYLLIUM
COATINGS
COHERENT SCATTERING
DIFFRACTION
DOPED MATERIALS
ELECTRON TUBES
ELECTRONIC EQUIPMENT
ELEMENTS
FABRICATION
LASER TARGETS
MAGNETRONS
METALS
MICROWAVE EQUIPMENT
MICROWAVE TUBES
SCATTERING
SPUTTERING
TARGETS
X-RAY DIFFRACTION