Radio frequency magnetron sputtering of thick film amorphous beryllium

Journal Article · Tue Jan 01 04:00:00 EST 1980 · J. Vac. Sci. Technol.; (United States)

DOI:https://doi.org/10.1116/1.570467· OSTI ID:5390853

Burt, R J; Meyer, S F; Hsieh, E J

Thick film coatings of beryllium, needed for the low-Z ablator layer in proposed laser fusion targets, have been prepared using high rate magnetron rf sputtering. The requirements for these Be coatings include thicknesses from 5 to 50 ..mu..m, complete freedom from surface defects, and an average surface roughness of 100 nm or less. These specifications are difficult to achieve if crystalline growth occurs during sputtering, since the surface roughness of thick grainy films can be on the order of micrometers. We have sputtered very smooth, dense Be films up to 25 ..mu..m thick with surface roughness less than 100 nm. X-ray diffraction analysis of impurity doped films indicates an amorphous-like structure. Impurity stabilized amorphous Be with smooth surfaces is reported on both 15/sup 0/C cooled copper and nominal 200/sup 0/C glass substrates. The sputtering parameters (substrate temperature, deposition rate, argon pressure, and impurity gas levels) affecting surface roughness and film structure are discussed in terms of SEM, AES, and x-ray diffraction results.

• Research Organization: University of California, Lawrence Livermore Laboratory, Livermore, California 94550
• DOE Contract Number: W-7405-ENG-48
• OSTI ID: 5390853
• Journal Information: J. Vac. Sci. Technol.; (United States), Journal Name: J. Vac. Sci. Technol.; (United States) Vol. 17:1; ISSN JVSTA
• Country of Publication: United States
• Language: English

Related Subjects

640301* -- Atomic
Molecular & Chemical Physics-- Beams & their Reactions
71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
ABLATION
ALKALINE EARTH METALS
AMORPHOUS STATE
AUGER ELECTRON SPECTROSCOPY
BERYLLIUM
COHERENT SCATTERING
COPPER
CRYSTAL DOPING
DEPOSITION
DIFFRACTION
ELECTRON MICROSCOPY
ELECTRON SPECTROSCOPY
ELECTRON TUBES
ELECTRONIC EQUIPMENT
ELEMENTS
FILMS
FLUIDS
GASES
GLASS
HIGH VACUUM
LASER TARGETS
MAGNETRONS
METALS
MICROSCOPY
MICROWAVE EQUIPMENT
MICROWAVE TUBES
SCATTERING
SPECTROSCOPY
SPUTTERING
SUBSTRATES
TARGETS
TRANSITION ELEMENTS
X-RAY DIFFRACTION