Evidence for graphitic-type bonding in glow discharge hydrogenated amorphous silicon carbon alloys

Journal Article · Mon Apr 15 04:00:00 EST 1985 · J. Appl. Phys.; (United States)

DOI:https://doi.org/10.1063/1.335412· OSTI ID:6013046

Mahan, A H; von Roedern, B; Williamson, D L; Madan, A

Amorphous silicon carbon (a-SiC:H) films have been deposited by the glow discharge technique using SiH/sub 4/ and CH/sub 4/ gas mixtures. At high discharge powers and low deposition chamber pressures, evidence for graphitic-type bonding in C-deficient a-SiC:H is found and correlations are made between the appearance of this bonding with significant changes in the electronic and structural properties. This graphitic-type bonding can be minimized by significant H attachment to C via CH/sub n/ (n = 2, 3) bonding. This results in a-SiC:H films with low gap state densities and sharp Urbach tails.

• Research Organization: Solar Energy Research Institute, Golden, Colorado 80401
• DOE Contract Number: AC02-83CH10093
• OSTI ID: 6013046
• Journal Information: J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Vol. 57:8; ISSN JAPIA
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360601 -- Other Materials-- Preparation & Manufacture
360602 -- Other Materials-- Structure & Phase Studies
360603* -- Materials-- Properties
ALKANES
ALLOYS
AMORPHOUS STATE
CARBIDES
CARBON
CARBON COMPOUNDS
CHEMICAL BONDS
COATINGS
CRYSTAL STRUCTURE
DEPOSITION
ELECTRIC CONDUCTIVITY
ELECTRIC DISCHARGES
ELECTRICAL PROPERTIES
ELEMENTAL MINERALS
ELEMENTS
ENERGY GAP
ENERGY-LEVEL DENSITY
FILMS
GLASS
GLOW DISCHARGES
GRAPHITE
HYDRIDES
HYDROCARBONS
HYDROGEN COMPOUNDS
INFRARED SPECTRA
METALS
METHANE
MINERALS
NONMETALS
ORGANIC COMPOUNDS
ORGANIC SILICON COMPOUNDS
PHOTOCONDUCTIVITY
PHYSICAL PROPERTIES
SEMIMETALS
SILANES
SILICON
SILICON ALLOYS
SILICON CARBIDES
SILICON COMPOUNDS
SPECTRA
SURFACE COATING
THIN FILMS
VACUUM COATING
VAPOR DEPOSITED COATINGS