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Collisional Energy Deposition Threshold for Extended Damage Depths in Ion-Implanted Silicates

Conference · · Materials Research Society Symposia Proceedings
DOI:https://doi.org/10.1557/proc-235-407· OSTI ID:6009121
 [1];  [2];  [3];  [4];  [4];  [4]
  1. Sandia National Laboratories (SNL-NM), Albuquerque, NM (United States)
  2. Consorzio INFM, Venezia (Italy); Universita di Venezia (Italy)
  3. EniChem Polimeri (ECP), Venezia (Italy)
  4. Consorzio INFM, Padova (Italy); Universita di Padova (Italy)
+ Show Author Affiliations

Many properties of implanted fused silica (e.g., surface stress, hardness) exhibit maximum implantation-induced changes for collisional energy deposition values of ~1020 keV/cm3. We have observed a second critical energy deposition threshold value of about 1022 keV/cm3 in stress and hardness measurements as well as in many other experiments on silicate glasses (leaching, alkali depletion, etching rate, gaseous implant redistribution). The latter show evidence for damage depths exceeding TRIM ranges by about a factor of 2. For crystalline quartz, a similar threshold value value has been found for extended damage depths (greater than TRIM) for 250 kev ions (H-Au) as measured by RBS and interference fringes. This phenomenon at high damage deposition energy may involve the large stress gradients between damaged and undamaged regions and the much increased diffusion coefficient for defect transport.

Research Organization:
Sandia National Laboratories (SNL-NM), Albuquerque, NM (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
AC04-76DP00789
OSTI ID:
6009121
Report Number(s):
SAND--91-1635C; CONF-911202--4; ON: DE92004737
Journal Information:
Materials Research Society Symposia Proceedings, Journal Name: Materials Research Society Symposia Proceedings Vol. 235; ISSN 0272-9172
Publisher:
Springer Nature
Country of Publication:
United States
Language:
English

References (8)

Ion implantation effects in alkali-borosilicate glasses journal September 1986
Ion implantation effects in glasses journal January 1982
Radiation damage enhancement of the penetration of water into silica glass journal May 1983
Use of ion beam techniques for studying the leaching properties of lead implanted silicates journal December 1983
Refractive index variations in proton-bombared fused silica journal May 1974
Sputtering process during ion implantation in glasses: mathematical and physical analysis journal January 1983
Enhanced diffusion processes during heavy ion irradiation of glasses journal May 1988
Compaction of ion‐implanted fused silica journal January 1974

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Related Subjects

36 MATERIALS SCIENCE
360605* -- Materials-- Radiation Effects
CRYSTAL DEFECTS
CRYSTAL STRUCTURE
ETCHING
HARDNESS
ION IMPLANTATION
MECHANICAL PROPERTIES
MINERALS
OXIDE MINERALS
OXYGEN COMPOUNDS
PHYSICAL RADIATION EFFECTS
QUARTZ
RADIATION EFFECTS
SILICATES
SILICON COMPOUNDS
SURFACE FINISHING